Mask 3D effect has been studied in the past and the main characteristic of it is that it will cause positive focus shift to the semi-dense patterns at pitches of 200 and 300 nm for as much as 20–30 nm ...

In this paper, we aim to enhance the performance of 3D height reconstruction from 2D printed circuit board (PCB) moiré images by removing and reconstructing the noise caused by light reflection and ...